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Hindi Commentary, J Nucl Ene Sci Power Generat Technol Vol: 2 Issue: 2
Plasma and Ion Sources Applications
| Abdelrahman MM* | |
| Accelerators & Ion Sources Department, Nuclear Research Center, Atomic Energy Authority, P.O. Box: 13759, Inchas, Cairo, Egypt |
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| Corresponding author : Abdelrahman MM Accelerators & Ion Sources Department, Nuclear Research Center, Atomic Energy Authority, P.O. Box: 13759, Inchas, Cairo, Egypt Tel: +201526584116 E-mail: moustafa82003@yahoo.com |
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| Received: January 26, 2013 Accepted: February 05, 2013 Published: February 14, 2013 | |
| Citation: Abdelrahman MM (2013) Plasma and Ion Sources Applications. J Nucl Ene Sci Power Generat Technol 2:2 doi:10.4172/2325-9809.1000107 |
Abstract
Plasma and Ion Sources Applications
People are constantly searching for a technology that will offer greater results with fewer treatments and less downtime. In the world of physics the term “plasma” denotes an electrically conducting medium formed by a gas containing a mixture of roughly equal numbers of free positive and negative charges, in a “quasi-neutral” condition. It is produced when part of the atoms or molecules in the gas become ionized and are sometimes referred to as the fourth state of matter, distinct from the solid, liquid and gaseous states. Gas discharge plasmas are utilized in a variety of applications such as light sources, plasma display panels, lasers, etching of surfaces and deposition of thin layers in the semiconductor industry. In addition, uses are found in surface modification, deposition of protective coating, in analytical chemistry (for the analysis of mainly solid materials), biotechnological and environmental applications.
